Semiconductor device having fin-type field effect transistor and method of manufacturing the same

ABSTRACT

A semiconductor device includes a first fin structure disposed on a substrate. The first fin structure extends in a first direction. A first sacrificial layer pattern is disposed on the first fin structure. The first sacrificial layer pattern includes a left portion and a right portion arranged in the first direction. A dielectric layer pattern is disposed on the first fin structure and interposed between the left and right portions of the first sacrificial layer pattern. A first active layer pattern extending in the first direction is disposed on the first sacrificial layer pattern and the dielectric layer pattern. A first gate electrode structure is disposed on a portion of the first active layer pattern. The portion of the first active layer is disposed on the dielectric layer pattern. The first gate electrode structure extends in a second direction crossing the first direction.

TECHNICAL FIELD

The present inventive concept relates to a semiconductor device having afin-type field effect transistor (FinFET), and a method of manufacturingthe same.

DISCUSSION OF RELATED ART

FinFET devices refer to three-dimensional (3D), multi-gate transistorsof which a conducting channel is formed of a fin- or nanowire-shapedsilicon body and a gate is formed on such silicon body. As feature sizeshave become more fine, high leakage current due to short-channel effectsmay deteriorate device performance.

SUMMARY

According to an exemplary embodiment of the present inventive concept, asemiconductor device includes a first fin structure disposed on asubstrate. The first fin structure extends in a first direction. A firstsacrificial layer pattern is disposed on the first fin structure. Thefirst sacrificial layer pattern includes a left portion and a rightportion arranged in the first direction. A dielectric layer pattern isdisposed on the first fin structure and interposed between the leftportion and the right portion of the first sacrificial layer pattern. Afirst active layer pattern is disposed on the first sacrificial layerpattern and the dielectric layer pattern. The first active layer patternextends in the first direction. A first gate electrode structure isdisposed on a portion of the first active layer pattern. The portion ofthe first active layer is disposed on the dielectric layer pattern. Thefirst gate electrode structure extends in a second direction crossingthe first direction.

According to an exemplary embodiment of the present inventive concept, asemiconductor device is provided. The semiconductor device includes afin structure protruding from a substrate. The fin structure extends ina first direction. A first epitaxial layer pattern is disposed on thefin structure. The first epitaxial layer pattern includes silicongermanium (SiGe). The first epitaxial layer is divided into a leftportion and a right portion arranged in the first direction. Adielectric layer pattern is interposed between the left portion and theright portion of the first epitaxial layer pattern. A second epitaxiallayer pattern is disposed on the sacrificial layer pattern and thedielectric layer pattern. The second epitaxial layer pattern extends inthe first direction. A gate electrode structure is disposed on thesecond epitaxial layer pattern. The gate electrode structure extends ina second direction crossing the first direction. The gate electrodestructure covers an upper surface and a sidewall of the second epitaxiallayer pattern and a sidewall of the dielectric layer pattern. A thirdepitaxial layer pattern is disposed on both sides of the gate electrodestructure. The third epitaxial layer pattern covers a portion of theupper surface and a sidewall of the second epitaxial layer pattern.

According to an exemplary embodiment of the present inventive concept, amethod of manufacturing a semiconductor device is provided. A finstructure is formed on a substrate. The fin structure extends in a firstdirection. A sacrificial layer pattern is formed on an upper surface ofthe fin structure. The sacrificial layer pattern includes a firstportion and a second portion. An active layer pattern including a firstportion and a second portion is formed on the sacrificial layer pattern.The first portion of the active layer pattern is formed on the firstportion of the sacrificial layer pattern. The second portion of theactive layer pattern is formed on the second portion of the sacrificiallayer pattern. A dummy gate pattern is formed on the first portion ofthe active layer pattern. The dummy gate pattern extends in a seconddirection crossing the first direction. The dummy gate pattern covers anupper surface and a sidewall of the first portion in the active layerpattern, and a sidewall of the first portion in the sacrificial layerpattern. An interlayer dielectric layer is formed on the dummy gatepattern and the second potion of the active layer pattern. Theinterlayer dielectric layer is planarized to expose the dummy gatepattern. The dummy gate pattern is removed to expose the first portionof the active layer pattern and the first portion of the sacrificiallayer pattern. The exposed first portion of the sacrificial layerpattern is removed to form a space between the exposed first portion ofthe active layer pattern and the upper surface of the fin structure. Adielectric layer pattern is formed in the space. A gate electrodestructure is formed on the exposed first portion of the active layerpattern. The gate electrode structure covers an upper surface and asidewall of the exposed first portion of the active layer pattern.

BRIEF DESCRIPTION OF THE DRAWINGS

These and other features of the inventive concept will become moreapparent by describing in detail exemplary embodiments thereof withreference to the accompanying drawings of which:

FIG. 1 is a perspective view illustrating a semiconductor deviceaccording to an exemplary embodiment of the inventive concept;

FIG. 2 is a cross-sectional view corresponding to line A-A of FIG. 1;

FIG. 3 is a cross-sectional view corresponding to line B-B of FIG. 1;

FIG. 4 is a cross-sectional view illustrating a semiconductor deviceaccording to an exemplary embodiment of the inventive concept;

FIGS. 5 and 6 are cross-sectional views illustrating a semiconductordevice according to an exemplary embodiment of the inventive concept;

FIG. 7 is a cross-sectional view illustrating a semiconductor deviceaccording to an exemplary embodiment of the inventive concept;

FIGS. 8 through 20 are cross-sectional views illustrating a method ofmanufacturing a semiconductor device according to an exemplaryembodiment of the inventive concept;

FIG. 21 is a block diagram illustrating a semiconductor device accordingto an exemplary embodiment of the inventive concept;

FIG. 22 is a block diagram illustrating a semiconductor device accordingto an exemplary embodiment of the inventive concept;

FIG. 23 is a system block diagram of a SoC (System on Chip) including asemiconductor device according to an exemplary embodiment of theinventive concept;

FIG. 24 is a block diagram of an electronic system including asemiconductor device according to an exemplary embodiment of theinventive concept; and

FIGS. 25 through 27 are several electronic products includingsemiconductor devices according to exemplary embodiments of theinventive concept.

DETAILED DESCRIPTION OF EXEMPLARY EMBODIMENTS

Exemplary embodiments of the inventive concept will be described belowin detail with reference to the accompanying drawings. However, theinventive concept may be embodied in different forms and should not beconstrued as limited to the embodiments set forth herein. In thedrawings, the thickness of layers and regions may be exaggerated forclarity. It will also be understood that when an element is referred toas being “on” another element or substrate, it may be directly on theother element or substrate, or intervening layers may also be present.It will also be understood that when an element is referred to as being“coupled to” or “connected to” another element, it may be directlycoupled to or connected to the other element, or intervening elementsmay also be present. Like reference numerals may refer to the likeelements throughout the specification and drawings.

FIG. 1 is a perspective view illustrating a semiconductor deviceaccording to an exemplary embodiment of the inventive concept. FIGS. 2and 3 are cross-sectional views corresponding to lines A-A and B-B ofFIG. 1, respectively.

Referring to FIGS. 1 through 3, a semiconductor device may include asubstrate 100, a fin structure FS, a sacrificial layer pattern 102, anactive layer pattern 104, a source/drain structure 128, a dielectriclayer pattern 140, and a gate electrode structure 150.

Hereinafter, the semiconductor device according to the exemplaryembodiment of the inventive concept will be described in detail withreference to a fin-type field effect transistor (FinFET), but is notlimited thereto.

The substrate 100 may include a bulk silicon substrate or asilicon-on-insulator (SOI) substrate. The substrate 100 may includesilicon (Si), germanium (Ge), silicon germanium (SiGe), indiumantimonide (InSb), lead telluride (PbTe), indium arsenide (InAs), indiumphosphide (InP), gallium arsenide (GaAs), and/or gallium antimonide(GaSb).

The substrate 100 may also include an epitaxial layer formed on a basesubstrate. If an active fin pattern is formed by using the epitaxiallayer, the epitaxial layer may include silicon (Si) or germanium (Ge).The epitaxial layer may also include a compound semiconductor, forexample, a 4-4 group compound semiconductor or a 3-5 group compoundsemiconductor. The 4-4 group compound semiconductor may be a binarycompound or a ternary compound having at least two materials of carbon(C), silicon (Si), germanium (Ge), and stannum (Sn). The 3-5 groupcompound semiconductor may be a binary compound, a ternary compound, ora quaternary compound having at least two materials of aluminum (Al),gallium (Ga), indium (In), phosphorus (P), arsenic (As), and antimony(Sb).

A fin structure FS may be formed on the substrate 100 and protruded to afirst direction (Z-axis) from the substrate 100. According to anexemplary embodiment of the inventive concept, the fin structure FS maybe formed of the same material with the substrate 100. Alternatively,the fin structure FS may include a different material from the substrate100. Alternatively, the fin structure FS may be formed by partiallyetching the substrate 100.

The fin structure FS may have a tapered shape having a larger bottomwidth or a rectangular shape having substantially the same width at thetop and at the bottom. The top edge of the fin structure FS may have arounded shape.

A device isolation structure 110 may be formed on the substrate 100 andmay cover a sidewall of the fin structure FS. The device isolationstructure 110 may be formed of an insulating layer, for example, asilicon oxide layer, a silicon nitride layer, or a silicon oxynitridelayer, but is not limited thereto.

Alternatively, the device isolation structure 110 may have ashallow-trench-isolation (STI) structure or a deep-trench-isolation(DTI) structure.

A sacrificial layer pattern 102 may be formed on the fin structure FS.The sacrificial layer pattern 102 may include a semiconductor material,for example, silicon germanium (SiGe). If the sacrificial layer pattern102 includes silicon germanium (SiGe), the proportion of germanium (Ge)in the sacrificial layer pattern 102 may be higher than that of silicon(Si) in the sacrificial layer pattern 102 for increasing etchingselectivity of the sacrificial layer pattern 102 from the other layerswhich have a lower proportion of germanium (Ge). The sacrificial layerpattern 102 may be divided into a left portion and a right portion in asecond direction (Y-axis).

A dielectric layer pattern 140 may be formed between the left portionand the right portion of the sacrificial layer pattern 102.

An active layer pattern 104 having a first portion and a second portionmay be formed on the sacrificial layer pattern 102 and the dielectriclayer pattern 140. The first portion of the active layer pattern 104 maybe formed on the dielectric layer pattern 140 and the second portion ofthe active layer pattern 102 may be formed on the sacrificial layerpattern 102. The active layer pattern 104 may be extended in the seconddirection (Y-axis). The active layer pattern 104 may include a siliconlayer or a 3-5 group compound semiconductor formed by using an epitaxialgrowth process. The active layer pattern 104 may be formed ofsubstantially the same material with the fin structure FS. The firstportion of the active layer pattern 104 may serve as a channel region ofa fin-type field effect transistor (FinFET) and the second portion ofthe active layer pattern 104 may serve as a part of a source/drainregion of the fin-type field effect transistor (FinFET).

A gate electrode structure 150 may be formed on the active layer pattern140. The gate electrode structure 150 may cross over the first portionof the active layer pattern 104 and be extended in a third direction(X-axis). The gate electrode structure 150 may include a gate dielectriclayer 152, a work-function control layer 154, and a metal gate electrodelayer 156.

A spacer 114 may be formed at both sidewalls of the gate electrodestructure 150, respectively. The spacer 114 may be formed of aninsulating layer, for example, a silicon oxide layer, a silicon nitridelayer, or a silicon oxynitride layer. In this case, the gate dielectriclayer 152 may be formed on the active layer pattern 104 and extendedupwardly along an inner sidewall of the spacer 114 as shown in FIG. 2.The gate dielectric layer 152 may include a high-k dielectric layer, forexample, a hafnium oxide layer, an aluminum oxide layer, a zirconiumoxide layer, or a tantalum oxide layer.

An interfacial layer may be formed between the gate dielectric layer 152and the active layer pattern 104. The interfacial layer may be formed ofa low-k dielectric layer having a dielectric constant less than 9. Forexample, the interfacial layer may be formed of a silicon oxide layer, asilicon oxynitride layer, or a mixture thereof.

The work-function control layer 154 may be formed on the gate dielectriclayer 152. The work-function control layer 154 may be extended in thefirst direction (Z-axis) along the sidewalls of the metal gate electrodelayer 156 and the spacer 114. The work-function control layer 154 maycontrol the work-function of the fin-type field effect transistor.

If the fin-type field effect transistor is a P-type Metal OxideSemiconductor (PMOS) transistor, the work-function control layer 154 mayinclude a p-type work-function control layer, for example, titaniumnitride (TiN), tantalum nitride (TaN), or a mixture thereof.

The metal gate electrode layer 156 may be formed on the work-functioncontrol layer 154. The metal gate electrode layer 156 may includealuminum (Al), tungsten (W), or a mixture thereof.

A source/drain structure 128 may be formed on the second portion of theactive layer pattern 104 and at both sides of the gate electrodestructure 150. The source/drain structure 128 may be formed by using aselective epitaxial growth process and may cover a portion of thesidewall of the active layer pattern 104, but is not limited thereto.

Alternatively, the source/drain structure 128 may be formed, without anyepitaxial layer, in the active layer pattern 104 by injecting impuritiestherein using an ion implantation process. For example, if the fin-typefield effect transistor is a PMOS transistor, the source/drain structure128 may include p-type impurities.

An interlayer dielectric layer 130 may be formed on the device isolationstructure 110. The interlayer dielectric layer 130 may cover thesacrificial layer pattern 102 and the source/drain structure 128.

According to an exemplary embodiment of the inventive concept, thedielectric layer pattern 140 may be formed under the first portion ofthe active layer pattern 104. The dielectric layer pattern 140 may serveto reduce leakage current of the fin-type field effect transistorcompared to that of a planar-type field effect transistor. As theresult, the reliability and the performance of the fin-type field effecttransistor may be increased.

FIG. 4 is a cross-sectional view illustrating a semiconductor deviceaccording to an exemplary embodiment of the inventive concept. For theconvenience of description, the description of the same elements as inthe above embodiment will be omitted.

Referring to FIG. 4, the substrate 100 may include a first region I anda second region II. A first fin-type field effect transistor may beformed in the first region I and a second fin-type field effecttransistor may be formed in the second region II.

The first fin-type field effect transistor may be substantially the samefin-type field effect transistor as described referring to FIG. 2.Therefore, the detail description of the first fin-type field effecttransistor will be omitted to simplify the explanation.

The second fin-type field effect transistor formed in the second regionII may include a fin structure FS, a sacrificial layer pattern 240, anactive layer pattern 204, a source/drain structure 228, and a gateelectrode structure 250.

The active layer pattern 204, the source/drain structure 228, and thegate electrode structure 250 may be substantially the same as thecorresponding elements as described with reference to FIG. 2, and thusthe detail description thereof will be omitted herein.

The sacrificial layer pattern 240 of the second fin-type field effecttransistor formed in the second region II may be formed of an insulatingfilm. Therefore, the insulating film may be formed not only under thesource/drain region 228 but also under the gate electrode structure 250.The insulating film may be extended in the second direction (Y-axis).

The first fin-type field effect transistor formed in the first region Iand the second fin-type field effect transistor formed in the secondregion II may have different conductivity types from each other. Forexample, the first fin-type field effect transistor may be a PMOStransistor and the second fin-type field effect transistor may be anN-type Metal Oxide Semiconductor (NMOS) transistor. Alternatively, thefirst and second fin-type field effect transistors may have the sameconductivity types as each other.

The sacrificial layer pattern 102 formed in the first region I mayinclude a material different from materials disposed in the sacrificiallayer pattern 240 formed in the second region II.

FIGS. 5 and 6 are cross-sectional views illustrating a semiconductordevice according to an exemplary embodiment of the inventive concept.

Referring to FIGS. 5 and 6, the substrate 100 may include a first regionI and a second region II. A first fin-type transistor may be formed inthe first region I and a second fin-type transistor may be formed in thesecond region II.

The first fin-type field effect transistor may be substantially the sameas the fin-type field effect transistor of FIG. 2. The detaildescription thereof will be omitted herein.

The second fin-type field effect transistor formed in the second regionII may include a fin structure FS, a sacrificial layer pattern 302, anactive layer pattern 304, a source/drain structure 328, a gate electrodestructure 350, a spacer 314, and a interlayer dielectric layer 330.

The sacrificial layer pattern 302, the active layer pattern 304, thesource/drain structure 328, the spacer 314, and the interlayerdielectric layer 330 are substantially the same as the correspondingelements as described with reference to FIGS. 2 and 3, and thus thedetail description thereof will be omitted herein.

The gate electrode structure 350 of the second fin-type transistorformed in the second region II may surround a portion of the activelayer pattern 304.

FIG. 7 is a cross-sectional view illustrating a semiconductor deviceaccording to an exemplary embodiment of the inventive concept.

Referring to FIG. 7, a substrate 100 may include a first region I and asecond region II. A first fin-type transistor TR1 may be formed in thefirst region I and a second fin-type transistor TR2 may be formed in thesecond region II.

The first fin-type field effect transistor TR1 formed in the firstregion I may be substantially the same as the fin-type field effecttransistor of FIG. 2. For example, an active layer pattern 104 a, asource/drain structure 128 a, a gate electrode structure 150 a, a spacer114 a, and an interlayer dielectric layer 130 a of the first fin-typefield effect transistor TR1 in FIG. 7 may be substantially the same asthe corresponding elements them of the fin-type field effect transistordescribed referring to FIG. 2.

The second fin-type field effect transistor TR2 formed in the secondregion II may be substantially the same fin-type field effect transistoras described referring to FIG. 2. For example, an active layer pattern104 b, a source/drain structure 128 b, a gate electrode structure 150 b,a spacer 114 b, and an interlayer dielectric layer 130 b of the secondfin-type field effect transistor TR2 may be substantially the same asthe corresponding elements as described with reference to FIG. 2.However, a first germanium concentration of the sacrificial layerpattern 102 a formed in the first region I may be different from asecond germanium concentration of the sacrificial layer pattern 102 bformed in the second region II.

The first fin-type field effect transistor TR1 formed in the firstregion I and the second fin-type field effect transistor TR2 formed inthe second region II may have different conductivity types from eachother. For example, the first fin-type field effect transistor TR1 maybe a PMOS transistor and the second fin-type field effect transistor TR2may be an NMOS transistor. In this case, the first germaniumconcentration of the first fin-type field effect transistor may begreater than the second germanium concentration of the second fin-typefield effect transistor.

The sacrificial layer pattern 102 a formed in the first region I mayinclude a material different from a material disposed in the sacrificiallayer pattern 102 b formed in the second region II.

FIGS. 8 through 20 are cross-sectional views illustrating a method ofmanufacturing a semiconductor device according to an exemplaryembodiment of the inventive concept. FIG. 16 is a cross-sectional viewcorresponding to line C-C of FIG. 15, FIG. 17 is a cross-sectional viewcorresponding to line D-D of FIG. 15, FIG. 19 is a cross-sectional viewcorresponding to line E-E of FIG. 18, and FIG. 20 is a cross-sectionalview corresponding to line F-F of FIG. 18.

Referring to FIG. 8, a sacrificial layer 102 may be formed on asubstrate 100 by using an epitaxial growth process. The sacrificiallayer may include a semiconductor material, for example, silicongermanium (SiGe). An active layer 104 may be formed on the sacrificiallayer 104 by using another epitaxial growth process. The active layer104 may include silicon (Si).

Referring to FIG. 9, the active layer 104, the sacrificial layer 102,and the substrate 100 may be successively etched to form a fin structureFS, a sacrificial layer pattern 102, and an active layer pattern 104.

Referring to FIG. 10, a device isolation structure 110 may be formed onthe substrate 100. The device isolation structure 110 may cover asidewall of the fin structure FS.

Alternatively, the fin structure FS, the sacrificial layer pattern 102,and the active layer pattern 104 may be formed on a silicon-on-insulator(SOI) substrate by using multiple epitaxial growth processes. Forexample, a first epitaxial layer including silicon (Si) may be formed ona substrate having an insulating layer thereon and a second epitaxiallayer including silicon germanium (SiGe) may be formed on the firstepitaxial layer, and a third epitaxial layer including silicon (Si) maybe formed on the second epitaxial layer. The third, the second, and thefirst epitaxial layer may be successively etched using a mask pattern toform the active layer pattern 104, the sacrificial layer pattern 102,and the fin structure which are formed on the silicon-on-insulator (SOI)substrate.

Referring to FIG. 11, a dummy gate structure 120 may be formed on theactive layer pattern 104. The dummy gate structure 120 may cross overthe active layer pattern 104 and be extended in a third direction(X-axis). The dummy gate structure 120 may cover a sidewall of theactive layer pattern 104 and a sidewall of the sacrificial layer pattern102. The dummy gate structure 120 may include a dummy gate dielectriclayer 122, a dummy gate layer 124, and a hard mask 126.

The dummy gate dielectric layer 122 may include a silicon oxide layer,and the dummy gate layer 124 may include a poly silicon layer, and thehard mask 126 may include a silicon nitride layer.

Referring to FIG. 12, an insulating layer may be formed on the dummygate structure 120. The insulating layer may be etched using ananisotropic etching process to form a spacer 114 on the sidewall of thedummy gate structure 120. A source/drain structure 128 may be formed atboth sides of the dummy gate structure 120. The source/drain structure128 may be formed on the active layer pattern 104 using an epitaxialgrowth process. The source/drain structure 128 may cover a portion ofthe sidewall of the sacrificial layer pattern 102 and a portion of thesidewall of the active layer pattern 104. The epitaxial growth processmay be performed after recessing an upper portion of active layerpattern 104.

Alternatively, the source/drain structure 128 may be formed using an ionimplantation process instead of the epitaxial growth process asdescribed above. For example, an impurity may be injected into theactive layer pattern disposed at both sides of the dummy gate structure120 to form a source/drain structure 128.

Referring to FIG. 13, an interlayer dielectric layer 130 may be formedon the source/drain structure 128 and the dummy gate structure 120. Theinterlayer dielectric layer 130 may be planarized to expose an uppersurface of the dummy gate structure 120 by using a planarizationprocess, for example, a chemical mechanical polishing (CMP) process. Thehard mask 126 may be removed after or during the planarization process.The interlayer dielectric layer 130 may include a silicon oxide layer ora silicon oxynitride layer, but is not limited thereto.

Referring to FIG. 14, the dummy gate layer 124 and the dummy gatedielectric layer 122 may be removed to expose a portion of the activelayer pattern 104 and a portion of a sidewall of the sacrificial layerpattern 102. For example, the dummy gate layer 124 may be removed usinga dry etch process and the dummy gate dielectric layer 122 may beremoved using a wet etch process, but is not limited thereto.

Referring to FIGS. 15 through 17, the exposed portion of the sacrificiallayer pattern 102 may be removed using a selective etching process.

The sacrificial layer pattern 102 including silicon germanium (SiGe) mayhave etch selectivity with respect to the active layer pattern that isformed of silicon (Si). For example, the exposed sacrificial layerpattern 102 may be removed using a hydrochloric acid (HCl) to form athrough-hole 103 which is disposed between the active layer pattern 104and the device isolation structure 110.

Referring to FIGS. 18 through 20, a dielectric layer pattern 140 may beformed in the through-hole 103. The dielectric layer pattern 140 may beformed between the divided sacrificial layer patterns 102.

Referring to FIGS. 1 through 3 again, the gate dielectric layer 152 maybe formed on the exposed upper surface and sidewall of the active layerpattern 104. The gate dielectric layer 152 may be further formed on thesidewall of the dielectric layer pattern 140.

The work-function control layer 154 may be formed on the gate dielectriclayer 152, and the metal gate electrode layer 156 may be formed on thework-function control layer 154.

FIG. 21 is a block diagram illustrating a semiconductor device accordingto an exemplary embodiment of the inventive concept. FIG. 22 is a blockdiagram illustrating a semiconductor device according to an exemplaryembodiment of the inventive concept.

Referring to FIG. 21, a semiconductor device 13 may include a logicregion 410 and a static random access memory (SRAM) region 420. A firsttransistor 411 may be disposed in the logic region 410, and a secondtransistor 421 may be disposed in the SRAM region 420. The types of thefirst transistor 411 and the second transistor 421 may be different fromeach other. For example, the first fin-type field effect transistor TR1of FIG. 7 may be applied to the first transistor 411 and the secondfin-type field effect transistor TR2 of FIG. 7 may be applied to thesecond transistor 421, respectively. Alternatively, the types of thefirst transistor 411 and the second transistor 421 may be the same. Forexample, the first fin-type field effect transistor TR1 of FIG. 7 may beapplied to the first transistor 411 and the second transistor 421.

Alternatively, the SRAM region may be replaced to a Dynamic RandomAccess Memory (DRAM) region, a Magnetoresistive Random Access Memory(MRAM) region, a Resistive Random Access Memory (RRAM) region, or aPhase-Change Random Access Memory (PRAM) region. Alternatively, thesemiconductor device may include at least one of the DRAM region, theMRAM region, the RRAM region, and the PRAM region in addition to theSRAM region and the logic region.

Referring to FIG. 22, a semiconductor device 14 may include a logicregion 410 including a third transistor 412 and a fourth transistor 422.The types of the third transistor 412 and the fourth transistor 422 maybe different from each other. For example, the first fin-type fieldeffect transistor TR1 of FIG. 7 may be applied to the third transistor412 and the second fin-type field effect transistor TR2 of FIG. 7 may beapplied to the fourth transistor 422, respectively. Alternatively, thetypes of the third transistor 412 and the fourth transistor 422 may bethe same. For example, the first fin-type field effect transistor TR1 ofFIG. 7 may be applied to the third transistor 412 and the fourthtransistor 422.

FIG. 23 is a system block diagram of a System on Chip (SoC) including asemiconductor device according to an exemplary embodiment of theinventive concept.

Referring to FIG. 23, the SoC 1000 may include an application processor1001 and a DRAM device 1060. The application processor 1101 may includea central processing unit 1010, a multimedia system 1020, a bus 1030, amemory system 1040, and a peripheral circuit 1050.

The central processing unit 1010 may perform operations required fordriving the SoC 1000. The multimedia system 1020 may include athree-dimensional engine module, a video codec, a display system, acamera system, or a post-processor. The central processing unit 1010,the multimedia system 1020, the memory system 1040, and the peripheralcircuit 1050 may communicate with each other through the bus 1030. Thebus 1030 may have a multi-layer structure, for example, a multi-layeradvanced high-performance bus (AHB) or a multi-layer advanced extensibleinterface (AXI).

The memory system 1040 may provide a required environment for performinga high-speed operation while the application processor 1001 is connectedwith an external device. The external device may be a DRAM device. Theperipheral circuit 1050 may allow the SoC 1000 to connect with anexternal device. In this case the external device may be a main board.The DRAM device 1060 may be disposed outside the application processor1001 as shown in FIG. 23. The DRAM device 1060 may be packaged with theapplication processor 1001 to form a package type of a Package onPackage (PoP).

At least one element of the SoC 1000 may include a semiconductor deviceaccording to an exemplary embodiment of the inventive concept.

FIG. 24 is a block diagram of an electronic system including asemiconductor device according to an exemplary embodiment of theinventive concept.

Referring to FIG. 24, an electronic system 1100 may include a controller1110, an input/output device 1120, a memory device 1130, an interface1140, and a bus 1150. The controller 1110, the input/output device 1120,the memory device 1130, and the interface 1140 may communicate with eachother through the bus 1150. The bus 1150 may correspond to a signal paththrough which data may be transferred.

The controller 1110 may include a microprocessor, a digital signalprocessor, a microcontroller, or a similar device that may control anexecutive program. The input/output device 1120 may include a keypad, akeyboard, or a display. The memory device 1130 may not only store codesor data for executing the controller 1110 but also save data executed bythe controller 1110. The memory device 1130 may include a semiconductordevice according to an exemplary embodiment of the inventive concept.

The system 1100 may be applied to a product that includes a PDA(personal digital assistant), a portable computer, a web tablet, awireless phone, a mobile phone, a digital music player, or a memorycard.

FIGS. 25 through 27 are several electronic products includingsemiconductor devices according to exemplary embodiments of theinventive concept. FIG. 25 is a view illustrating a tablet personalcomputer 1200, FIG. 26 is a view illustrating a notebook computer 1300,and FIG. 27 is a view illustrating a smart phone 1400. A semiconductordevice according to at least one exemplary embodiment of the inventiveconcept may be applied to the tablet personal computer 1200, thenotebook computer 1300, or the smart phone 1400.

While the present inventive concept has been shown and described withreference to exemplary embodiments thereof, it will be apparent to thoseof ordinary skill in the art that various changes in form and detail maybe made therein without departing from the spirit and scope of theinventive concept as defined by the following claims.

What is claimed is:
 1. A semiconductor device, comprising: a first finstructure disposed on a substrate, the first fin structure extending ina first direction; a first sacrificial layer pattern disposed on anupper surface of the first fin structure, the first sacrificial layerpattern including a left portion and a right portion arranged in thefirst direction, wherein the left portion and the right portion areseparated from each other; a dielectric layer pattern disposed on theupper surface of the first fin structure and interposed between the leftportion and the right portion of the first sacrificial layer pattern; afirst active layer pattern disposed on the first sacrificial layerpattern and the dielectric layer pattern, the first active layer patternextending in the first direction, wherein the first active layer patternis in contact with the first sacrificial layer pattern and thedielectric layer pattern; and a first gate electrode structure disposedon a portion of the first active layer pattern disposed on thedielectric layer pattern, the first gate electrode structure extendingin a second direction crossing the first direction and the portion ofthe first active layer pattern being interposed between the dielectriclayer pattern and the first gate electrode structure, wherein the firstfin structure protrudes in a third direction from the substrate, andwherein the third direction is substantially perpendicular to the firstand second directions.
 2. The semiconductor device of claim 1, furthercomprising: a spacer disposed on a sidewall of the first gate electrodestructure; and a source/drain structure disposed on the first activelayer pattern, wherein the source/drain structure is separated from thefirst gate electrode structure by the spacer, and wherein the firstsacrificial layer pattern is disposed under the source/drain structurewithout being disposed under the first gate electrode structure.
 3. Thesemiconductor device of claim 2, wherein the source/drain structure isdisposed on an upper surface and a sidewall of the first active layerpattern.
 4. The semiconductor device of claim 1, wherein the firstsacrificial layer pattern comprises a semiconductor material.
 5. Thesemiconductor device of claim 4, wherein the semiconductor material issilicon germanium (SiGe).
 6. The semiconductor device of claim 1,wherein the first gate electrode structure comprises a gate dielectriclayer, a work-function control layer, and a metal gate electrode layer.7. The semiconductor device of claim 6, wherein the gate dielectriclayer is disposed on a sidewall and a bottom of the metal gate electrodelayer.
 8. The semiconductor device of claim 1, wherein the first activelayer pattern comprises a same material as the first fin structure. 9.The semiconductor device of claim 1, further comprising: a second finstructure disposed on the substrate; a second sacrificial layer patterndisposed on the second fin structure, the second sacrificial layerpattern having a different material from the first sacrificial layerpattern; a second active layer pattern disposed on the secondsacrificial layer pattern; and a second gate electrode layer disposed onthe second active layer pattern.
 10. The semiconductor device of claim9, wherein the first sacrificial layer pattern comprises a semiconductormaterial and the second sacrificial layer pattern comprises siliconoxide.
 11. The semiconductor device of claim 10, wherein the secondsacrificial layer pattern is disposed under the second active layerpattern and extended in the first direction.
 12. The semiconductordevice of claim 1, further comprising: a second sacrificial layerpattern disposed on the substrate; a second active layer patterndisposed on the second sacrificial layer pattern; and a second gateelectrode layer disposed on the second active layer pattern, wherein adielectric layer pattern is not disposed under the second active layerpattern.
 13. The semiconductor device of claim 5, further comprising: asecond sacrificial layer pattern disposed on the substrate; and a secondactive layer pattern disposed on the second sacrificial layer pattern,wherein a first concentration of germanium (Ge) contained in the firstsacrificial layer pattern is different from a second concentration ofgermanium (Ge) contained in the second sacrificial layer pattern. 14.The semiconductor device of claim 13, further comprising: a firstsource/drain structure disposed on an upper surface and a sidewall ofthe first active layer pattern; and a second source/drain structuredisposed on an upper surface and a sidewall of the second active layerpattern, wherein a first impurity contained in the first source/drainstructure is different in a conductivity type from a second impuritycontained in the second source/drain structure.